Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Citation Rate 2026
0734-2101
eISSN 1520-8559
American Institute of Physics
US
Q2 Quartile Established Impact
About Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (JVSTVSF) is a peer-reviewed academic journal, published by American Institute of Physics in US, catalogued under ISSN 0734-2101 (e-ISSN 1520-8559). As of 2026, it has a 2025 2-Year Citation Rate (OpenAlex) of 2.14 (Q2 quartile) — the average number of citations its recent articles received over a two-year window, computed from OpenAlex open citation data, not the Clarivate (JCR) Impact Factor. It operates a subscription model.
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Citation Rate 2026 — In Context
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films has a 2025 2-Year Citation Rate (OpenAlex) of 2.14, placing it in the Q2 quartile. This is the average number of citations the journal's recent articles received over a two-year window, computed from OpenAlex open citation data — not the Clarivate (JCR) Journal Impact Factor.
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films operates a subscription-based publishing model — readers access articles through institutional subscriptions or pay-per-view.
Researchers looking to publish in Journal of Vacuum Science & Technology A Vacuum Surfaces and Films should review the journal's submission tips and verify the latest indexing status against Scopus, DOAJ, and Web of Science using our indexing tracker. To compare Journal of Vacuum Science & Technology A Vacuum Surfaces and Films against similar journals in the field, use our journal comparison tool.
| ISSN (Print) | 0734-2101 |
|---|---|
| ISSN (Online) | 1520-8559 |
| Publisher | American Institute of Physics |
| Country | United States |
| APC / Cost | Inquire with Publisher |
In-depth profile & metrics
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films is published by American Institute of Physics and based in United States.
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films is indexed in OpenAlex. OpenAlex tracking provides an open, citable record of its output even where commercial indexing is absent.
Its most recent citation rate stands at 2.142.
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Live Indexing Status
Updated April 2026Track real-time indexing metrics to ensure this journal meets your academic requirements.
Citation Rate
Historical Trend
Initial data points onlyCitation Rate by Year
| Year | Value | Source |
|---|---|---|
| 2025 | 2.142 | 2-Year Mean Citedness (OpenAlex) |
Metrics are sourced from OpenAlex, DOAJ and Scopus and reflect the latest data we hold. The headline figure is a 2-year citation rate (OpenAlex), not a Clarivate Impact Factor. Always verify against the journal's official site before relying on it. See our Methodology or report a correction.
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Metadata
Last updated: Apr 24, 2026
Updated by: openalex_bulk
OpenAlex ID: S4210190837
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