IEEE Transactions on Plasma Science Journal Citation Rate 2026

ISSN 0093-3813 eISSN 1939-9375 Institute of Electrical and Electronics Engineers US

Q3 Quartile

About IEEE Transactions on Plasma Science
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IEEE Transactions on Plasma Science (ITPS) is a peer-reviewed academic journal, published by Institute of Electrical and Electronics Engineers in US, catalogued under ISSN 0093-3813 (e-ISSN 1939-9375). As of 2026, it has a 2025 2-Year Citation Rate (OpenAlex) of 1.29 (Q3 quartile) — the average number of citations its recent articles received over a two-year window, computed from OpenAlex open citation data, not the Clarivate (JCR) Impact Factor. It operates a subscription model.

IEEE Transactions on Plasma Science Citation Rate 2026 — In Context

IEEE Transactions on Plasma Science has a 2025 2-Year Citation Rate (OpenAlex) of 1.29, placing it in the Q3 quartile. This is the average number of citations the journal's recent articles received over a two-year window, computed from OpenAlex open citation data — not the Clarivate (JCR) Journal Impact Factor.

IEEE Transactions on Plasma Science operates a subscription-based publishing model — readers access articles through institutional subscriptions or pay-per-view.

Researchers looking to publish in IEEE Transactions on Plasma Science should review the journal's submission tips and verify the latest indexing status against Scopus, DOAJ, and Web of Science using our indexing tracker. To compare IEEE Transactions on Plasma Science against similar journals in the field, use our journal comparison tool.

ISSN (Print) 0093-3813
ISSN (Online) 1939-9375
Publisher Institute of Electrical and Electronics Engineers
Country United States
APC / Cost Inquire with Publisher
In-depth profile & metrics

IEEE Transactions on Plasma Science is published by Institute of Electrical and Electronics Engineers and based in United States.

IEEE Transactions on Plasma Science is indexed in OpenAlex. OpenAlex tracking provides an open, citable record of its output even where commercial indexing is absent.

Its most recent citation rate stands at 1.293.

Links
Frequently Asked Questions about IEEE Transactions on Plasma Science

IEEE Transactions on Plasma Science does not hold a Clarivate (JCR) Impact Factor on JournalsHub. Its 2-year citation rate, computed from OpenAlex open citation data, is 1.293 — an open proxy for citation impact, not the licensed JCR Impact Factor.

No, IEEE Transactions on Plasma Science is not an open access journal.

IEEE Transactions on Plasma Science is published by Institute of Electrical and Electronics Engineers.

IEEE Transactions on Plasma Science shows strong legitimacy signals: it is indexed in OpenAlex. Indexing in recognised databases such as Scopus and DOAJ is a reliable indicator of a peer-reviewed, non-predatory journal, because predatory titles are typically excluded from them. Always confirm the journal's scope and editorial board fit your work before submitting.

The ISSN of IEEE Transactions on Plasma Science is 0093-3813. Its electronic ISSN (eISSN) is 1939-9375.

IEEE Transactions on Plasma Science sits in the Q3 quartile based on its latest impact factor of 1.29, ranked across all journals in our database.
Live Indexing Status
Updated April 2026

Track real-time indexing metrics to ensure this journal meets your academic requirements.

OpenAlex
Verified
DOAJ
Non-OA
Predatory Check
Clean
Citation Rate
1.293
2-Year Citation Rate (OpenAlex) · 2025
Historical Trend
Initial data points only
Citation Rate by Year
Year Value Source
2025 1.293 2-Year Mean Citedness (OpenAlex)

Metrics are sourced from OpenAlex, DOAJ and Scopus and reflect the latest data we hold. The headline figure is a 2-year citation rate (OpenAlex), not a Clarivate Impact Factor. Always verify against the journal's official site before relying on it. See our Methodology or report a correction.

Metadata

Last updated: Apr 24, 2026

Updated by: openalex_bulk

OpenAlex ID: S164692974

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